Amorphous Carbon and Silica-based Films Synthesized by Atmospheric Pressure Plasma CVD Method

dc.contributor.author	Noborisaka, Mayui / 登坂, 万結	en_US
dc.date.accessioned	2014-05-09T07:09:30Z
dc.date.available	2014-05-09T07:09:30Z
dc.date.issued	2013-03-23	en_US
dc.description	博士（工学）, 2012, 開放環境科学専攻	en_US
dc.identifier.uri	http://iroha.scitech.lib.keio.ac.jp:8080/sigma/handle/10721/2625
dc.publisher	慶應義塾大学理工学研究科	en_US
dc.subject	大気圧プラズマ	ja
dc.subject	DLC	ja
dc.subject	シリカ	ja
dc.subject	薄膜	ja
dc.subject	化学蒸着	ja
dc.subject	Atmospheric pressure plasma	en
dc.subject	DLC	en
dc.subject	silica	en
dc.subject	thin film	en
dc.subject	CVD	en
dc.title	Amorphous Carbon and Silica-based Films Synthesized by Atmospheric Pressure Plasma CVD Method	en_US
dc.title.alternative	大気圧プラズマ化学蒸着法で作製した非晶質炭素膜とシリカ系薄膜	en_US
dc.type	学位論文	en_US

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